This inventor holds 4 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2007-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007-2010
Title: The Innovative Contributions of Tarreg Mawari
Introduction
Tarreg Mawari is a notable inventor based in Manassas, VA (US). He has made significant contributions to the field of plasma technology, holding a total of 4 patents. His work focuses on methods for monitoring and determining plasma characteristics, which are crucial in various industrial applications.
Latest Patents
One of his latest patents is titled "Method for monitoring process drift using plasma characteristics." This method involves obtaining metrics of current and voltage information from waveforms coupled to plasma during a plasma process on a substrate. By analyzing these metrics, the method allows for the adjustment of the plasma process based on the determined characteristics of the plasma. Another significant patent is "Method for determining plasma characteristics." This method also utilizes metrics from waveforms at different frequencies to ascertain plasma characteristics, providing a plasma impedance model as a function of frequency.
Career Highlights
Tarreg Mawari is currently employed at Applied Materials, Inc., where he continues to innovate in the field of plasma technology. His work has implications for improving manufacturing processes and enhancing the efficiency of plasma applications.
Collaborations
Some of his notable coworkers include Daniel John Hoffman and Jeremiah T P Pender. Their collaborative efforts contribute to the advancement of technology in their field.
Conclusion
Tarreg Mawari's innovative work in plasma technology and his contributions through multiple patents highlight his role as a significant inventor in the industry. His methods for monitoring and determining plasma characteristics are paving the way for advancements in various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
