The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Jan. 16, 2009
Steven C. Shannon, San Mateo, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Jeremiah T. P. Pender, San Jose, CA (US);
Tarreg Mawari, Manassas, VA (US);
Steven C. Shannon, San Mateo, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Jeremiah T. P. Pender, San Jose, CA (US);
Tarreg Mawari, Manassas, VA (US);
Applied Materials Inc., Santa Clara, CA (US);
Abstract
Methods for monitoring process drift using plasma characteristics are provided. In one embodiment, a method for monitoring process drift using plasma characteristics includes obtaining metrics of current and voltage information of a first waveform coupled to a plasma during a plasma process formed on a substrate, obtaining metrics of current and voltage information of a second waveform coupled to the plasma during the plasma process formed on the substrate, the first and second waveforms having different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform, and adjusting the plasma process in response to the determined at least one characteristic of the plasma.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile