The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2009
Filed:
Jun. 05, 2007
Steven C. Shannon, San Mateo, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Jeremiah T. P. Pender, San Jose, CA (US);
Tarreg Mawari, Manassas, VA (US);
Steven C. Shannon, San Mateo, CA (US);
Daniel J. Hoffman, Saratoga, CA (US);
Jeremiah T. P. Pender, San Jose, CA (US);
Tarreg Mawari, Manassas, VA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage information for first and second waveforms coupled to a plasma at different frequencies, determining at least one characteristic of the plasma using the metrics obtained from each different frequency waveform. In another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, and determining at least one characteristic of a plasma using model. In yet another embodiment, the method includes providing a plasma impedance model of a plasma as a function of frequency, measuring current and voltage for waveforms coupled to the plasma and having at least two different frequencies, and determining ion mass of a plasma from model and the measured current and voltage of the waveforms.