Tangkuei Wang

Title: Tangkuei Wang: Innovator in Plasma Processing Technology

Introduction

Tangkuei Wang is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, particularly through his innovative methods of etching.

Latest Patents

Wang holds a patent for a "Method of etching and apparatus for plasma processing." This patent describes a method that includes preparing a substrate with a first region made of silicon oxide and a second region made of silicon nitride. The etching process involves exposing the substrate to plasma from a first processing gas that includes a fluorocarbon gas. This results in the formation of a deposit containing fluorocarbon on both regions. The etching is then carried out by utilizing radicals from the fluorocarbon deposit, followed by the removal of the deposit using plasma from a second processing gas that does not contain oxygen. Wang has 1 patent to his name.

Career Highlights

Tangkuei Wang is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on advancing plasma processing techniques, which are crucial for the fabrication of microelectronic devices.

Collaborations

Wang collaborates with various professionals in his field, including his coworker Masanori Hosoya. Their combined expertise contributes to the development of innovative solutions in plasma processing.

Conclusion

Tangkuei Wang's contributions to plasma processing technology highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape advancements in etching techniques, demonstrating the importance of his work.