This inventor holds 4 USPTO granted patents and 3 published patent applications and 4 EPO patents. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2021-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yokohama, JP (2021)
- Annaka, JP (2022 - 2023)
Company Filing History:
Years Active: 2021-2025
Title: **Tamotsu Oowada: Innovator in Photosensitive Resin Technology**
Introduction
Tamotsu Oowada is a prominent inventor based in Annaka, Japan. With a total of four patents to his name, Oowada has made significant contributions to the development of photosensitive resin compositions and their applications in various light-emitting devices.
Latest Patents
Oowada's latest patents reflect his deep expertise in the field of photosensitive materials. His invention of a photosensitive resin composition involves a combination of an acid-crosslinkable group-containing silicone resin, a photo-acid generator, and quantum dot particles. This innovative composition enables the creation of films with superior heat resistance, exceptional lithography resolution, and enhanced luminous properties. Furthermore, his patents include a photosensitive resin film and a photosensitive dry film derived from this composition. These advances allow for efficient patterning processes, leading to the development of advanced light emitting devices. Another significant patent describes a black photosensitive resin composition that improves adhesion, crack resistance, resolution, and flexibility while maintaining effective light shielding properties.
Career Highlights
Tamotsu Oowada is employed by Shin-Etsu Chemical Co., Ltd., a leader in chemical manufacturing known for its innovative technologies. His work at this esteemed company highlights his role in advancing photoresist technology, contributing essential knowledge and expertise to the development of sophisticated materials used in electronics and other high-tech industries.
Collaborations
Throughout his career, Oowada has collaborated with talented individuals such as Hitoshi Maruyama and Yoichiro Ichioka. These partnerships fostered a creative environment that has led to successful innovations in photosensitive resin technologies.
Conclusion
In conclusion, Tamotsu Oowada stands out as an influential inventor in the field of photosensitive materials. His groundbreaking work at Shin-Etsu Chemical Co., Ltd., along with his noteworthy patents, underscores his role in pushing the boundaries of innovation in the industry. Oowada’s contributions not only enhance technological capabilities but also pave the way for future advancements in photonic applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile