logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12216405 B1

PDFFull Text
Date of Patent:
Feb. 04, 2025

Filed:

Nov. 12, 2020

Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Hitoshi Maruyama, Annaka, JP;

Tamotsu Oowada, Yokohama, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/075 (2006.01); C08G 77/20 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/105 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 77/20 (2013.01); G03F 7/0047 (2013.01); G03F 7/105 (2013.01); G03F 7/40 (2013.01);
Abstract

A photosensitive resin composition containing (A) an acid-crosslinkable group-containing silicone resin, (B) a photo-acid generator, and (C) quantum dot particles. Thus, a photosensitive resin composition is capable of easily forming a film having favorable heat resistance, lithography resolution, and luminous properties; a photosensitive resin film and a photosensitive dry film are obtained by using the photosensitive resin composition; patterning processes use these; and a light emitting device is obtained by using the photosensitive resin composition.

Find Patent Forward Citations

Maruyama, Hitoshi. (2025). Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device (U.S. Patent No. 12216405). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12216405

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…