The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2023
Filed:
Jul. 03, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Hitoshi Maruyama, Annaka, JP;
Tamotsu Oowada, Annaka, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 63/00 (2006.01); G03F 7/075 (2006.01); C08K 3/04 (2006.01); C08L 61/06 (2006.01); C08L 61/28 (2006.01); C08L 83/04 (2006.01); C08L 83/16 (2006.01); G03F 7/004 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08K 3/04 (2013.01); C08L 61/06 (2013.01); C08L 61/28 (2013.01); C08L 63/00 (2013.01); C08L 83/04 (2013.01); C08L 83/16 (2013.01); G03F 7/0045 (2013.01); G03F 7/16 (2013.01);
Abstract
A black photosensitive resin composition comprising (A) an acid crosslinkable group-containing silicone resin, (B) carbon black, and (C) a photoacid generator is coated onto a substrate to form a photosensitive resin coating which has improved reliability with respect to adhesion and crack resistance, resolution and flexibility while maintaining satisfactory light shielding properties.
Maruyama, Hitoshi. (2023). Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix (U.S. Patent No. 11693318). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11693318
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile