This inventor holds 1 USPTO granted patent. Top assignees: Adtec Plasma Technology Co., Ltd., Hitachi-Kokusai Electric Inc., Other. Active years: 2009.
Company Filing History:

Years Active: 2009
Title: Tamiya Fujiwara: Innovator in Plasma and Ozone Generation
Introduction
Tamiya Fujiwara is a notable inventor based in Morioka-shi, Iwate, Japan. He has made significant contributions to the field of plasma and ozone generation, showcasing his expertise through innovative patents. His work focuses on creating efficient and user-friendly devices for semiconductor manufacturing.
Latest Patents
Tamiya Fujiwara holds a patent for a plasma generator, ozone generator, substrate processing apparatus, and manufacturing method of semiconductor devices. This invention aims to provide a generator capable of generating plasma and ozone with high efficiency and ease of handling, featuring a simple structure. The design includes an electrode part formed of electrodes without dielectric material interposed between them. An arc-extinguishing capacitor serves as a charge storage component, connected in series to the electrode part. An AC power source generates plasma by causing self-arc-extinguishing discharge between the electrodes while applying AC voltage to charge and discharge the arc-extinguishing capacitor. The unit is designed to be multi-polarized, enhancing its functionality.
Career Highlights
Throughout his career, Tamiya Fujiwara has worked with prominent companies such as Hitachi Kokusai Electric Inc. and Adtec Plasma Technology Co., Ltd. His experience in these organizations has contributed to his development as an inventor and innovator in the field of plasma technology.
Collaborations
Tamiya has collaborated with notable coworkers, including Noriyoshi Sato and Takeshi Taniguchi. Their combined expertise has likely influenced the advancements in the technologies they have worked on together.
Conclusion
Tamiya Fujiwara's contributions to plasma and ozone generation reflect his innovative spirit and dedication to advancing semiconductor manufacturing technologies. His patent and career achievements highlight his role as a significant figure in the field.