Takuto Inoue

Title: Takuto Inoue: Innovator in Semiconductor Technology

Introduction

Takuto Inoue is a prominent inventor based in Kitakami, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative manufacturing methods and edge detection techniques for transparent substrates.

Latest Patents

Inoue's latest patents include a semiconductor device and a manufacturing method thereof. This patent describes a semiconductor device that features a substrate with first and second main surfaces, a through hole, a pad, and a through electrode. The manufacturing method involves forming an isolation region and processing the substrate to expose part of the pad.

Another notable patent is an edge detection method for transparent substrates. This method involves preparing a transparent substrate with specific inclination angles and detecting non-emitting regions to determine the edges of the substrate. These innovations showcase Inoue's expertise in enhancing semiconductor device functionality and precision.

Career Highlights

Takuto Inoue is associated with Kabushiki Kaisha Toshiba, a leading company in technology and electronics. His work at Toshiba has allowed him to develop cutting-edge solutions that contribute to advancements in semiconductor manufacturing.

Collaborations

Inoue collaborates with talented coworkers, including Itsuko Sakai and Masayuki Dohi. Their combined efforts in research and development have led to significant innovations in their respective fields.

Conclusion

Takuto Inoue is a distinguished inventor whose contributions to semiconductor technology are noteworthy. His patents reflect a commitment to innovation and excellence in the industry.