Company Filing History:
37 out of 5,966 
1 out of 42 Years Active: 2016-2025
Title: **Takuro Kosaka: Pioneer in Phase Shift Mask Technology**
Introduction
Takuro Kosaka, based in Joetsu, Japan, is a prominent inventor renowned for his significant contributions to the field of optical lithography through his extensive work on phase shift masks. With an impressive portfolio of 35 patents, he has made remarkable advancements that enhance the capabilities and applications of photolithography in semiconductor manufacturing.
Latest Patents
Among his most recent innovations are groundbreaking patents concerning phase shift masks. One such patent details a phase shift mask blank that incorporates a transparent substrate, an etching protection film, and a phase shift film optimized for exposure using ArF excimer laser light. The etching protection film, composed of hafnium and oxygen or silicon and hafnium, exhibits a thickness between 1 to 30 nm and maintains an impressive transmittance of at least 85% regarding exposure light. The phase shift film contains silicon, devoid of hafnium, with a thickness ranging from 50 to 90 nm.
Additionally, he has developed a substrate with a film for a reflective mask blank. This innovation features a multilayer reflection film and a back surface conductive film with contrasting compositions on either side. The film in contact with the substrate is primarily silicon and nitrogen, while the remote side comprises tantalum, supplemented by silicon, germanium, or aluminum.
Career Highlights
Takuro Kosaka's career has been largely associated with Shin-Etsu Chemical Co., Ltd., where his pioneering work in developing advanced photolithography materials has positioned the company as a leader in the semiconductor field. His relentless pursuit of innovation in manufacturing methods has had a profound impact on the efficiency and precision of semiconductor devices, keeping pace with the rapidly evolving technological landscape.
Collaborations
Throughout his impressive career, Kosaka has collaborated with esteemed colleagues like Yukio Inazuki and Hideo Kaneko. Together, they have contributed to a collaborative culture of innovation that pushes the boundaries of technological development. Their combined expertise has led to an array of developments that improve manufacturing techniques and products in the semiconductor industry.
Conclusion
In conclusion, Takuro Kosaka stands out as a vital figure in the realm of optical lithography and semiconductor manufacturing. His pioneering patents and collaborations continue to drive innovation, setting new standards and enhancing the fabric of modern technology. As advances in this field continue to unfold, Kosaka's contributions will remain fundamental in shaping the future of electronic devices and photolithographic practices.
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