The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Apr. 08, 2022
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Takuro Kosaka, Niigata, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A reflective mask blank has a substrate; a multilayer reflective filmthat is provided on the substrateand reflects exposure light; a protective filmincluding a metal oxide filmprovided on the multilayer reflective film; and an absorber filmthat is provided on the protective filmand absorbs exposure light. The multilayer reflective filmis configured such that a Mo layer and a Si layer are alternately stacked and a layer on a side farthest from the substrateis the Si layer. The metal oxide filmis configured such that an oxygen content in a layer on a side far from the substrateis higher than the oxygen content in a layer on a substrate side.