Takeshi Fukiura

Title: Innovations of Takeshi Fukiura in Semiconductor Technology

Introduction

Takeshi Fukiura is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work primarily focuses on pressure sensors, which are crucial in various applications across industries.

Latest Patents

Fukiura's latest patents include a semiconductor pressure sensor with strain gauges formed on a silicon diaphragm. This innovative pressure sensor features a silicon substrate with a diaphragm that distorts based on applied pressure. Strain gauges are strategically placed on the main surface of the silicon substrate, utilizing conductive diffusion resistors that differ from the substrate material. Additionally, a getter is incorporated on the main surface, surrounding the strain gauges, to capture metal impurities, particularly iron atoms, present in the silicon substrate.

Another significant patent involves a semiconductor pressure sensor and its manufacturing method. In this process, a portion of an n-type single-crystal silicon layer corresponding to the pressure-sensitive region is etched using a silicon oxide layer as an etching stopper. The exposed silicon oxide layer is then removed, allowing for the formation of a diaphragm by etching the pressure-sensitive region of the n-type single-crystal silicon layer to a predetermined depth.

Career Highlights

Throughout his career, Fukiura has worked with prominent companies, including Yamatake Corporation and Yamatake-Honeywell Co., Ltd. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

Fukiura has collaborated with notable colleagues such as Shigeo Kimura and Yoshiyuki Ishikura. These partnerships have fostered a creative environment that has led to advancements in semiconductor applications.

Conclusion

Takeshi Fukiura's contributions to semiconductor technology, particularly in pressure sensors, highlight his innovative spirit and dedication to advancing the field. His patents and collaborations reflect a commitment to excellence in engineering and invention.