Oshu, Japan

Takeshi Ando

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Oshu, JP (2018)
  • Yamanashi, JP (2024)

Company Filing History:


Years Active: 2018-2025

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Takeshi Ando

Introduction

Takeshi Ando is a prominent inventor based in Oshu, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 4 patents to his name, Ando's work has advanced the capabilities of plasma processing apparatuses and methods.

Latest Patents

Ando's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus features a cylindrical processing chamber with a sidewall that has an opening, designed to accommodate substrates on respective stages. This apparatus includes a plasma compartment wall that is hermetically sealed at the sidewall of the processing chamber, effectively closing the opening. The plasma compartment wall defines a plasma formation space, which is crucial for the processing operations. Additionally, the apparatus is equipped with a first plasma electrode pair and a second plasma electrode pair, both arranged opposite each other on the outer surface of the plasma compartment wall.

Another notable patent is the plasma generating apparatus, which consists of an electrode pair that includes a first plasma electrode and a second plasma electrode facing each other. This apparatus is powered by an RF power supply, which is connected to a matching unit that optimizes the power delivery to the electrodes. The matching unit comprises variable capacitors and coils that enhance the efficiency of the plasma generation process.

Career Highlights

Takeshi Ando is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to focus on innovative plasma processing technologies that are essential for modern manufacturing processes.

Collaborations

Ando has collaborated with notable coworkers, including Hiroyuki Matsuura and Takeshi Kobayashi. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the field of plasma processing.

Conclusion

Takeshi Ando's contributions to plasma processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of plasma processing applications.

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