Tokyo, Japan

Takeo Shioya



Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 20(Granted Patents)


Location History:

  • Mie, JP (2002)
  • Tokyo, JP (2014 - 2023)

Company Filing History:


Years Active: 2002-2023

Loading Chart...
Loading Chart...
11 patents (USPTO):Explore Patents

Title: Takeo Shioya: Innovator in Fluorine-Containing Polymers

Introduction

Takeo Shioya is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of fluorine-containing polymers. With a total of 11 patents to his name, Shioya's work has had a substantial impact on various applications, including liquid immersion lithography.

Latest Patents

Shioya's latest patents focus on a novel fluorine-containing polymer and its applications in radiation-sensitive resin compositions. These innovations aim to enhance the performance of liquid immersion lithography by providing patterns with excellent shape and depth of focus. The fluorine-containing polymer is designed to minimize the elution of components in immersion liquids, such as water, during exposure. This results in a larger receding contact angle between the resist film and the immersion liquid, improving the overall efficiency of the lithography process.

Career Highlights

Throughout his career, Takeo Shioya has been associated with JSR Corporation, where he has played a crucial role in advancing polymer technology. His expertise in developing materials that meet the demands of modern lithography has positioned him as a key figure in the industry. Shioya's innovative approach has led to breakthroughs that are essential for the production of high-precision electronic components.

Collaborations

Shioya has collaborated with notable colleagues, including Yukio Nishimura and Hiroki Nakagawa. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the pursuit of cutting-edge research in polymer science.

Conclusion

Takeo Shioya's contributions to the field of fluorine-containing polymers and his innovative patents have significantly advanced the capabilities of liquid immersion lithography. His work continues to influence the development of new materials that are essential for modern technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…