Kawasaki, Japan

Takeo Konno


Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2015-2020

Loading Chart...
3 patents (USPTO):

Title: **The Innovator Behind Advanced Sputtering Technology: Takeo Konno**

Introduction

Takeo Konno is an accomplished inventor hailing from Kawasaki, Japan, known for his contributions to the field of sputtering technology. With a patent portfolio of three significant inventions, Konno continues to push the boundaries of innovation in material deposition processes.

Latest Patents

Among Takeo Konno's latest patents is a groundbreaking sputtering apparatus designed to enhance the efficiency of film deposition. This innovative apparatus features a substrate holder paired with a cathode unit strategically placed at a diagonal position relative to the substrate holder. The device incorporates a position sensor that detects the rotational position of the substrate and a holder rotation controller that adjusts the rotation speed accordingly. Notably, the controller optimizes the rotation speed based on the cathode unit’s position, allowing for a lower speed when the unit is aligned with a particular direction of the substrate’s relief structure. This technology showcases a sophisticated approach to improving the uniformity and quality of deposited films.

Career Highlights

Konno's ingenuity has been instrumental at Canon Anelva Corporation, where he has developed and refined various sputtering technologies. His work is characterized by a deep understanding of both mechanical and material science, enabling him to craft solutions that meet industry demands.

Collaborations

Throughout his career, Takeo Konno has collaborated with fellow innovators such as Masahiro Suenaga and Koji Tsunekawa. Their teamwork has fostered an environment of creativity and shared knowledge, leading to the development of advanced technologies that benefit the field of film deposition.

Conclusion

Takeo Konno is a prominent figure in the innovation landscape of sputtering technology. His patented inventions not only reflect his dedication to advancing technology but also contribute significantly to the efficiency and effectiveness of film deposition methods. As he continues to work at Canon Anelva Corporation, the impact of his inventions is expected to resonate throughout the industry for years to come.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…