This inventor holds 2 USPTO granted patents. Top assignee: Tdk Corporation. Active years: 2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002
Title: Takehiro Horinaka: Innovator in Film Thickness Measurement and Polishing Methods
Introduction
Takehiro Horinaka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of film thickness measurement and polishing methods, holding a total of 2 patents. His work is particularly relevant in the manufacturing of thin film magnetic heads, which are essential components in various electronic devices.
Latest Patents
Horinaka's latest patents include a film thickness measuring method and a polishing method, as well as a fabrication method for thin film magnetic heads. The film thickness measuring method aims to provide high accuracy in measuring the residual film thickness of a polishing object during the polishing process. This innovation is crucial for ensuring the quality and performance of thin film magnetic heads. The polishing method focuses on reducing variations in the residual film thickness on the surface of the material being polished, thereby enhancing the overall manufacturing process.
Career Highlights
Horinaka is associated with TDK Corporation, a leading company in electronic components and solutions. His work at TDK has allowed him to develop and refine techniques that are vital for the production of high-performance magnetic heads. His inventions have contributed to advancements in the electronics industry, particularly in improving the efficiency and accuracy of manufacturing processes.
Collaborations
Throughout his career, Horinaka has collaborated with notable colleagues, including Toshio Kubota and Masumi Sugawara. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies in the field.
Conclusion
Takehiro Horinaka's contributions to film thickness measurement and polishing methods have made a significant impact on the electronics industry. His innovative patents and collaborative efforts continue to drive advancements in technology, ensuring high-quality manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile