The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2002
Filed:
Nov. 30, 1999
Toshio Kubota, Tokyo, JP;
Masumi Sugawara, Tokyo, JP;
Takehiro Horinaka, Tokyo, JP;
Fujimi Kimura, Tokyo, JP;
TDK Corporation, Tokyo, JP;
Abstract
This invention relates to a polishing method for polishing a surface of a material to be polished and a fabrication method of a thin film magnetic head having a planarization process for planarizing the surface of the material to be polished by polishing, and an object thereof is to reduce variations of a residual film thickness on the surface of a material to be polished after polishing. An insulating film is formed on an AlTiC substrate and a bottom shielding layer is formed thereover. After forming a coating layer and etching a mask layer as an etching mask, a protruding portion of the coating layer at the bottom of the opening of the mask layer is removed by a desired thickness. Since a protruding portion of the coating layer on the periphery of the opening of the mask layer is suitably undercut, the protruding portion is shaved, thereby obtaining the coating layer which is planarized as a whole.