Location History:
- Santa Clara, CA (US) (2002)
- Ichikawa Chiba, JP (2002)
- Chiba, JP (2002 - 2003)
Company Filing History:
Years Active: 2002-2003
Title: Takehiko Komatsu: Innovator in Plasma Etching Technology
Introduction
Takehiko Komatsu is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of plasma etching technology, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of oxide etching processes.
Latest Patents
Among his latest patents is a method for magnetically enhanced plasma oxide etching using hexafluorobutadiene. This innovative oxide etch process is practiced in a plasma etch reactor, specifically in a magnetically enhanced reactive ion etch (MERIE) reactor. The etching gas comprises approximately equal amounts of a hydrogen-free fluorocarbon, most preferably C4F8, and oxygen, along with a significantly larger amount of argon diluent gas. The magnetic field is maintained above about 50 gauss, with pressure at 40 milliTorr or above, and chamber residence times of less than 70 milliseconds. A two-step process may be employed for etching holes with very high aspect ratios, where the magnetic field and oxygen flow are reduced in the second step. Additionally, other fluorocarbons with F/C ratios of less than 2 may be substituted, preferably no more than 1.6 or 1.5.
Another notable patent involves a magnetically enhanced plasma etch process using a heavy fluorocarbon etching gas. Similar to his previous work, this process is also practiced in a MERIE plasma reactor, utilizing a comparable etching gas composition and operational parameters.
Career Highlights
Takehiko Komatsu is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. His expertise in plasma etching has positioned him as a key player in advancing technologies that are critical for the production of microelectronics.
Collaborations
Throughout his career, Komatsu has collaborated with notable colleagues, including Jingbao Liu and Bryan Y Pu. These partnerships have fostered innovation and contributed to the development of cutting-edge etching technologies.
Conclusion
Takehiko Komatsu's contributions to plasma etching technology have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.