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For the Inventor, By the Inventor

Tochigi, Japan

Takehiko Iwanaga

This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignee: Canon Kabushiki Kaisha. Active years: 1994-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takehiko Iwanaga. Retrieved from https://idiyas.com/inventor/takehiko-iwanaga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 60.0

Average Co-Inventor Count = 1.3

ph-index = 4

Forward Citations = 67(Granted Patents)


Location History:

  • Kawasaki, JP (1994)
  • Utsunomiya, JP (1996 - 1999)
  • Kituregawamachi, JP (2002)
  • Tochigi, JP (2004 - 2006)

Company Filing History:

goldMedal10 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1994-2006

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10 patents (USPTO):Explore Patents
1. 7072027 - Exposure apparatus, method of controlling same, and method of manufacturing devices (2006-07-04),
2. 7046336 - Scanning exposure apparatus (2006-05-16),
3. 6954259 - Scanning exposure apparatus (2005-10-11),
4. 6909372 - Power monitoring unit, control method therefor, and exposure apparatus (2005-06-21),
5. 6816239 - Exposure apparatus, method of controlling same, and method of manufacturing devices (2004-11-09),
6. 6788391 - Illumination device, exposure apparatus and exposure method (2004-09-07),
7. 6396562 - Microdevice manufacturing apparatus (2002-05-28),
8. 5920398 - Surface position detecting method and scanning exposure method using the (1999-07-06),
9. 5581348 - Surface inspecting device using bisected multi-mode laser beam and (1996-12-03),
10. 5347118 - Aligning method and apparatus detecting misalignment using image signals (1994-09-13),

Title: Takehiko Iwanaga: Innovator in Scanning Exposure Technology

Introduction

Takehiko Iwanaga is a prominent inventor based in Tochigi, Japan. He has made significant contributions to the field of scanning exposure technology, holding a total of 10 patents. His work primarily focuses on enhancing the efficiency and precision of exposure apparatuses used in manufacturing devices.

Latest Patents

Iwanaga's latest patents include innovative technologies such as an exposure apparatus and methods for controlling the same. One notable invention is a scanning exposure apparatus that features a projection optical system designed to project patterns formed on a mask onto an object. This apparatus includes a stage that holds the object and moves in a direction perpendicular to the optical axis of the projection system. Additionally, it incorporates a measurement system that accurately measures the position of the object's surface in response to a reset signal. The generation system is responsible for producing this reset signal when the stage reaches predetermined positions. Another significant patent involves a scanning exposure apparatus that supports and moves a substrate, with a control unit that initiates exposure after a specific sequence of acceleration sections.

Career Highlights

Takehiko Iwanaga is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to develop cutting-edge technologies that are essential for modern manufacturing processes.

Collaborations

Iwanaga has collaborated with notable colleagues such as Kazuhito Outsuka and Yuichi Yamada. Their combined expertise has contributed to the advancement of technologies in the field of scanning exposure.

Conclusion

Takehiko Iwanaga's innovative work in scanning exposure technology has made a significant impact on the industry. His patents reflect a commitment to improving manufacturing processes through advanced optical systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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