The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Sep. 06, 2002
Applicant:
Inventor:
Takehiko Iwanaga, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/758 ; G03B 2/762 ;
U.S. Cl.
CPC ...
G03B 2/758 ; G03B 2/762 ;
Abstract
An exposure apparatus includes a stage which moves with an object thereon. A surface position detector is arranged to detect a surface position of the object at a timing that is asynchronous to a reference signal, and is provided for controlling the stage.
Iwanaga, Takehiko. (2004). Exposure apparatus, method of controlling same, and method of manufacturing devices (U.S. Patent No. 6816239). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6816239
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile