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For the Inventor, By the Inventor

Miyagi, Japan

Takehiko Arita

This inventor holds 8 USPTO granted patents and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2021-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takehiko Arita. Retrieved from https://idiyas.com/inventor/takehiko-arita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8 

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal8 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2021-2026

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8 patents (USPTO):Explore Patents
1. 12687331 - Movable coolant processing apparatus (2026-07-21),
2. 12500101 - Temperature control system and system of processing substrate (2025-12-16),
3. 11835278 - Temperature control medium processing apparatus and temperature control medium processing method (2023-12-05),
4. 11817334 - Substrate processing apparatus and substrate processing method (2023-11-14),
5. 11692639 - Valve device (2023-07-04),
6. 11404251 - Processing apparatus for processing target object (2022-08-02),
7. 11237577 - Temperature control system including multiple valves and temperature control method (2022-02-01),
8. 10907864 - Cooling system (2021-02-02),

Title: Takehiko Arita: Innovator in Temperature Control Technologies

Introduction

Takehiko Arita is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of temperature control technologies, holding a total of 8 patents. His innovative work has advanced the efficiency and effectiveness of substrate processing systems.

Latest Patents

Arita's latest patents include a "Temperature Control Medium Processing Apparatus and Temperature Control Medium Processing Method." This invention features a tank designed to store temperature control medium, along with a first inlet path for introducing the medium and an outlet path for its removal. The apparatus is equipped with a pump to facilitate the flow of the medium, enhancing the overall processing capabilities.

Another notable patent is the "Substrate Processing Apparatus and Substrate Processing Method." This system comprises multiple substrate-processing chambers, each equipped with target components for temperature control. A chiller supplies two different temperature-controlling mediums at varying flow rates, allowing for precise control over the processing environment.

Career Highlights

Takehiko Arita is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this organization has allowed him to develop and refine his innovative technologies, contributing to the company's reputation for excellence.

Collaborations

Arita collaborates with talented coworkers, including Kei Kobayashi and Haruka Kaneko. Their combined expertise fosters a creative environment that drives innovation and enhances the development of new technologies.

Conclusion

Takehiko Arita's contributions to temperature control technologies exemplify his dedication to innovation. His patents reflect a commitment to improving substrate processing systems, making a lasting impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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