This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2017.
Company Filing History:
Years Active: 2017
Title: Takeaki Shiroki: Innovator in Resist Pattern Formation
Introduction
Takeaki Shiroki is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist pattern formation, which is crucial in the semiconductor manufacturing process. His innovative work has led to the development of a unique resist composition that enhances the efficiency of pattern formation.
Latest Patents
Takeaki Shiroki holds a patent for a "Resist pattern formation method and resist composition." This method includes the formation of a resist film, exposure, development, and subsequent rinsing using a resist composition containing a high-molecular compound. The composition features a constituent unit represented by a specific formula, which includes an acid decomposable group and various other functional groups. This innovation is essential for improving the precision and effectiveness of resist patterning in advanced manufacturing.
Career Highlights
Shiroki is currently employed at Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the electronics industry. His work has been instrumental in pushing the boundaries of resist technology, making him a key figure in his field.
Collaborations
Throughout his career, Takeaki Shiroki has collaborated with esteemed colleagues such as Yoichi Hori and Shinichi Hidesaka. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Takeaki Shiroki's contributions to resist pattern formation and his innovative patent highlight his importance in the field of semiconductor technology. His work continues to influence advancements in manufacturing processes, showcasing the impact of dedicated inventors in the industry.