Tokyo Ohka Kogyo Co., Ltd.

Takeaki Shiroki

Yoichi Hori

Shinichi Hidesaka

A resist pattern formation method including formation of a resist film, exposure, development, and subsequent rinsing using a resist composition containing a high-molecular compound having a constituent unit represented by the formula (a0-1), a constituent unit containing an acid decomposable group whose polarity increases by the action of an acid, and a constituent unit containing a group represented by the formula (a2-r-1). R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Rarepresents a lactone-containing polycyclic group, an &#x2014;SO-containing polycyclic group, or a cyano group-containing polycyclic group; Ra'represents a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, &#x2014;COOR&#x2033;, &#x2014;OC(&#x2550;O)R&#x2033;, a hydroxyalkyl group, or a cyano group; R&#x2033; represents a hydrogen atom or an alkyl group; and n&#x2032; represents an integer of from 0 to 2. 

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Kawasaki, Japan

Takeaki Shiroki