Toyama, Japan

Takayuki Nakada

This inventor holds 28 USPTO granted patents and 2 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Kokusai Electric Corporation, Hitachi-Kokusai Electric Inc.. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takayuki Nakada. Retrieved from https://idiyas.com/inventor/takayuki-nakada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 89.3

Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 525(Granted Patents)


Company Filing History:


Years Active: 2011-2026

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Areas of Expertise:
Semiconductor Device
Substrate Processing
Thermometer
Manufacturing Method
Fluid Circulation
Reaction Tube
Process Chamber
Recording Medium
Inner Pressure Adjustment
Device Manufacturing
28 patents (USPTO):Explore Patents

Title: Takayuki Nakada: Innovator in Semiconductor Processing Technology

Introduction

Takayuki Nakada, based in Toyama, Japan, is a prominent inventor renowned for his contributions to the field of semiconductor manufacturing. With an impressive portfolio of 25 patents, his work primarily focuses on substrate processing techniques that improve efficiency and performance in semiconductor devices.

Latest Patents

Two of Takayuki Nakada's latest patents showcase his innovative approaches in the semiconductor industry. The first patent is a **Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device**, which details a technique designed to reduce the cooling time for a substrate. This invention includes various components such as a substrate retainer, a heat-insulating unit, a transfer chamber, and a gas supply mechanism. The mechanism efficiently supplies gas into different regions of the transfer chamber, optimizing the processing environment for substrates.

The second patent, titled **Substrate Processing Device, Manufacturing Method for Semiconductor Device, and Reaction Tube**, involves a substrate processing apparatus featuring a substrate holding member capable of accommodating multiple substrates. This system incorporates a reaction tube that processes the substrates while maintaining an efficient gas supply and exhaust system. The design enhances processing capabilities by partitioning gas supply and exhaust areas, creating a more controlled processing atmosphere.

Career Highlights

Throughout his career, Takayuki Nakada has made significant contributions while working at notable companies, including Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. His experience at these leading firms has greatly influenced his inventive work, allowing him to develop advanced technologies that push the boundaries of semiconductor manufacturing.

Collaborations

Takayuki Nakada has collaborated with accomplished coworkers in the field, such as Tomoshi Taniyama and Hidenari Yoshida. Their combined expertise and teamwork have facilitated the development of innovative solutions that address various challenges in the semiconductor industry.

Conclusion

In summary, Takayuki Nakada stands out as a key figure in semiconductor processing innovation. His extensive experience, coupled with a strong focus on developing efficient processing techniques, has led to numerous patents that enhance the manufacturing of semiconductor devices. Through his innovative approaches, Nakada continues to pave the way for advancements in this vital sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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