The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Dec. 30, 2019
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Takayuki Nakada, Toyama, JP;

Tomoshi Taniyama, Toyama, JP;

Kenji Shirako, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01); C23C 16/54 (2006.01); C23C 16/44 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/455 (2013.01); C23C 16/402 (2013.01); C23C 16/4401 (2013.01); C23C 16/54 (2013.01); H01L 21/02164 (2013.01); H01L 21/02271 (2013.01); H01L 21/67017 (2013.01); H01L 21/67109 (2013.01); H01L 21/67201 (2013.01); H01L 21/67303 (2013.01); H01L 21/67772 (2013.01);
Abstract

A substrate processing apparatus including a transfer chamber; upper gas supply mechanism that supplies a gas into an upper region of the transfer chamber through a first gas supply port; and lower gas supply mechanism that supplies the gas into a lower region of the transfer chamber through a second gas supply port. The upper gas supply mechanism includes a first buffer chamber disposed at a back surface of the first gas supply port; a pair of upper ducts disposed at both sides of the first buffer chamber; and a first ventilation unit disposed at lower ends of the pair of upper ducts. The lower gas supply mechanism includes a second buffer chamber disposed at a back surface of the second gas supply port; a lower duct disposed at lower surface of the second buffer chamber; and a second ventilation unit disposed at a lower end of the lower duct.


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