Ibaraki, Japan

Takayoshi Tanabe

This inventor holds 15 USPTO granted patents. Top assignees: Jsr Corporation, Dsm IP Assets B.v., Japan Fine Coatings Co. Ltd.. Active years: 1999-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takayoshi Tanabe. Retrieved from https://idiyas.com/inventor/takayoshi-tanabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 140(Granted Patents)


Location History:

  • Mie, JP (1999)
  • Yokkaichi, JP (1999 - 2001)
  • Ibaraki, JP (2004 - 2006)
  • Umezone, JP (2006)
  • Tokyo, JP (2007 - 2012)

Company Filing History:


Years Active: 1999-2012

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15 patents (USPTO):Explore Patents

Takayoshi Tanabe: A Brilliant Inventor in the Field of Photosensitive Resins

Introduction:

In the world of innovations and patents, few inventors have made a significant impact. Takayoshi Tanabe is one such inventor who has made notable contributions to the field of photosensitive insulating resin compositions. With a portfolio of 15 patents and a distinguished career, Tanabe's work has greatly influenced optical stereolithography and tridimensional modeling.

Latest Patents:

Among his latest patents, two stand out as groundbreaking inventions. The first is the "Photosensitive Insulating Resin Composition, Cured Product Thereof, and ABA Block Copolymer." This composition comprises a block copolymer, a crosslinking agent, a photosensitive compound, and a solvent. The block copolymer includes two structural units represented by specific formulas, providing enhanced insulating properties.

The second remarkable invention is the "Radioactive Ray-Curable Liquid Resin Composition for Use in Optical Stereolithography, and Optically Shaped Article Produced by Curing the Composition." This resin composition exhibits excellent storage stability for optical tridimensional modeling. It contains compounds such as a cationic polymerizable compound, a radical polymerization initiator, and a polyether polyol compound.

Career Highlights:

Tanabe's career flourished with key contributions to the field of photosensitive resins. He worked at reputable companies such as JSR Corporation and DSM IP Assets B.V., where he honed his skill set and transformed his innovative ideas into patented inventions. His extensive knowledge and expertise have led to advancements in resin-based technologies, particularly in the areas of insulation and stereolithography.

Collaborations:

Throughout his career, Tanabe has collaborated with several notable individuals in the industry. Among his esteemed coworkers are Shin-ichiro Iwanaga and Eiichi Kobayashi. These collaborations have fostered an exchange of ideas and expertise, contributing to the progress and development of novel resin compositions.

Conclusion:

Takayoshi Tanabe's contributions to the field of photosensitive resins have left a lasting impact on the world of innovations and patents. With a substantial portfolio of patents and a remarkable career at renowned companies, his work has propelled advancements in optical stereolithography and tridimensional modeling. Tanabe's inventions continue to inspire and shape the future of resin-based technologies, making him an esteemed inventor in his field.

Disclaimer: The information provided in this article is based on available data and research. For more detailed and up-to-date information, please refer to official sources and documents related to Takayoshi Tanabe's work and patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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