The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Aug. 18, 1998
Eiichi Kobayashi, Yokkaichi, JP;
Makoto Shimizu, Yokkaichi, JP;
Takayoshi Tanabe, Yokkaichi, JP;
Shin-ichiro Iwanaga, Yokkaichi, JP;
JSR Corporation, Tokyo, JP;
Abstract
Positive as well as negative radiation sensitive resin compositions that, in addition to being capable of providing excellent resolution and pattern profile, are particularly excellent in avoiding the problems of 'nano-edge roughness' or 'coating surface roughness'. The positive type radiation sensitive resin composition comprises (A) (a) an acid-decomposable group-containing resin, or (b) an alkali-soluble resin and an alkali dissolution controller, and (B) a photoacid generator comprising 'a compound that upon exposure to radiation generates a carboxylic acid having a boiling point of 150.degree. C. or higher', and 'a compound that upon exposure to radiation generates an acid other than a carboxylic acid'. The negative type radiation sensitive resin composition comprises (C) an alkali-soluble resin, (D) a cross-linking agent, and the component (B) as described above.