Fukaya, Japan

Takayoshi Dohi

This inventor holds 4 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1999-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takayoshi Dohi. Retrieved from https://idiyas.com/inventor/takayoshi-dohi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 61(Granted Patents)


Location History:

  • Hyogo-ken, JP (1999)
  • Fukaya, JP (2000 - 2004)

Company Filing History:


Years Active: 1999-2004

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4 patents (USPTO):Explore Patents

Title: Takayoshi Dohi: Innovator in Semiconductor Technology

Introduction

Takayoshi Dohi is a prominent inventor based in Fukaya, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Dohi's latest patents include a semiconductor device manufacturing method and apparatus. This invention involves patterning a silicon-containing thin film over an insulating substrate using vapor-phase chemical etching. During this process, a resist pattern formed on the thin film acts as a mask. The invention detects luminescence intensity A of wavelengths in a predetermined range and luminescence intensity B at a specific wavelength. The ratio of these intensities (B/A) is used to determine the termination time of the patterning process.

Another notable patent is a method of manufacturing a semiconductor device and an apparatus for the same. This invention describes the continuous formation of a thin-film transistor on a glass substrate. A first thin film of amorphous silicon is formed on the substrate, followed by a second thin film. The second thin film is then etched to create a mask pattern, allowing for the doping of a dopant ion into the first thin film to form source and drain regions without exposing the substrate to the atmosphere.

Career Highlights

Takayoshi Dohi is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has been instrumental in advancing semiconductor manufacturing techniques. Dohi's innovative approaches have contributed to the efficiency and effectiveness of semiconductor devices used in various applications.

Collaborations

Dohi has collaborated with notable coworkers, including Yasuhisa Oana and Kaichi Fukuda. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

In summary, Takayoshi Dohi is a key figure in semiconductor innovation, with a focus on improving manufacturing methods. His contributions have had a lasting impact on the industry, and his patents reflect his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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