Tomisato, Japan

Takashi Yoshida

This inventor holds 1 USPTO granted patent. Top assignee: Ulvac, Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Yoshida. Retrieved from https://idiyas.com/inventor/takashi-yoshida-eey4xns9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Takashi Yoshida: Innovator in Film Formation Technology

Introduction

Takashi Yoshida is a notable inventor based in Tomisato, Japan. He has made significant contributions to the field of film formation technology, particularly through his innovative methods and apparatus.

Latest Patents

Yoshida holds a patent for a film formation method and apparatus. This method involves forming an organic layer that comprises a fluorine-containing resin on an inorganic layer, which is formed on a substrate and consists of an inorganic substance. The process utilizes a reactive sputtering procedure with water vapor as a reactive gas to create the inorganic layer on the substrate. Following this, the organic layer is applied to the inorganic layer, showcasing a novel approach to film formation.

Career Highlights

Takashi Yoshida is associated with Ulvac, Inc., a company known for its advancements in vacuum technology and related fields. His work has contributed to the development of efficient film formation techniques that are essential in various applications.

Collaborations

Yoshida has collaborated with notable colleagues, including Masahiro Matsumoto and Noriaki Tani. Their combined expertise has likely enhanced the innovation and implementation of film formation technologies.

Conclusion

Takashi Yoshida's contributions to film formation technology exemplify the impact of innovative thinking in the field of materials science. His patent and work at Ulvac, Inc. highlight the importance of advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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