Osaka, Japan

Takashi Namikawa

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Settsu, JP (2020)
  • Osaka, JP (2017 - 2024)

Company Filing History:


Years Active: 2017-2024

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11 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Takashi Namikawa

Introduction

Takashi Namikawa is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of film forming methods and materials, holding a total of 11 patents. His work has been influential in advancing technologies related to semiconductor and insulator applications.

Latest Patents

Among his latest patents is a film forming method and apparatus designed to create films on substrates with varying surface characteristics. This method includes a self-assembled monolayer (SAM) forming process that utilizes a perfluoropolyether group-containing compound. Additionally, he has developed a silane compound that contains a perfluoro(poly)ether group, which is crucial for enhancing the properties of the films produced.

Career Highlights

Throughout his career, Takashi Namikawa has worked with notable companies such as Daikin Industries, Ltd. and Hokkaido University. His experience in these organizations has allowed him to refine his expertise in material science and film technology.

Collaborations

He has collaborated with esteemed colleagues, including Hisashi Mitsuhashi and Yosuke Kishikawa, contributing to various innovative projects and research initiatives.

Conclusion

Takashi Namikawa's contributions to the field of film forming methods and materials have established him as a key figure in innovation. His patents reflect a commitment to advancing technology and improving material applications in various industries.

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