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For the Inventor, By the Inventor

Hitachi, Japan

Takashi Kumaki

This inventor holds 8 USPTO granted patents. Top assignee: Hitachi Chemical Company, Ltd.. Active years: 2009-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Kumaki. Retrieved from https://idiyas.com/inventor/takashi-kumaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 62.5

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:

goldMedal8 out of 1,641 
 
Hitachi Chemical Company, Ltd.
 patents

Years Active: 2009-2013

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8 patents (USPTO):Explore Patents
1. 8501392 - Photosensitive element, method for formation of resist pattern, and method for production of print circuit board (2013-08-06),
2. 8198008 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board (2012-06-12),
3. 8192916 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board (2012-06-05),
4. 8105759 - Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition (2012-01-31),
5. 7993809 - Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board (2011-08-09),
6. 7622243 - Photosensitive element, resist pattern formation method and printed wiring board production method (2009-11-24),
7. 7504471 - Sulfur-containing phenolic resin, process for preparing the same, phenol derivatives having thioether structure or disulfide structure, process for preparing the same and epoxy resin composition and adhesive (2009-03-17),
8. 7491789 - Disulfide-containing phenolic resin as curing agent for epoxy resin (2009-02-17),

Title: The Innovations of Takashi Kumaki

Introduction

Takashi Kumaki is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of photosensitive elements and related technologies. With a total of 8 patents to his name, Kumaki's work has had a substantial impact on the industry.

Latest Patents

Kumaki's latest patents include innovative technologies such as a photosensitive element, a method for the formation of resist patterns, and a method for the production of printed circuit boards. The photosensitive element he developed comprises a support, a photosensitive layer, and a protective film laminated in that order. The photosensitive layer is composed of a photosensitive resin composition that contains a binder polymer, a photopolymerizing compound, a photopolymerization initiator, and a compound with a maximum absorption wavelength of 370-420 nm. The protective film is primarily made of polypropylene. Additionally, his photosensitive resin composition includes a binder polymer, a photopolymerizable compound with an ethylenically unsaturated bond, and a specific compound represented by a general formula, showcasing his innovative approach to enhancing photosensitive materials.

Career Highlights

Kumaki is currently employed at Hitachi Chemical Company, Ltd., where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of photosensitive elements and their applications in various industries.

Collaborations

Some of his notable coworkers include Masahiro Miyasaka and Haruaki Sue, who have collaborated with him on various projects, contributing to the success of their innovations.

Conclusion

Takashi Kumaki's contributions to the field of photosensitive elements and related technologies highlight his role as a leading inventor in Japan. His innovative patents and ongoing work at Hitachi Chemical Company, Ltd. continue to shape the future of this industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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