Sanda, Japan

Takashi Komekyu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Mitsubishi Materials Corporation, Sumco Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Komekyu. Retrieved from https://idiyas.com/inventor/takashi-komekyu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovations of Takashi Komekyu

Introduction

Takashi Komekyu is a notable inventor based in Sanda, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of plasma etching. His work has led to advancements that enhance the durability and efficiency of silicon electrode plates.

Latest Patents

One of Komekyu's most important patents is for a silicon electrode plate designed for plasma etching. This innovative plate boasts superior durability and is composed of silicon single crystal. In terms of atomic ratio, it contains between 3 to 11 parts per billion atom (ppba) of boron, along with a total of 0.5 to 6 ppba of either phosphorus or arsenic, or both. This patent highlights his expertise in materials science and engineering.

Career Highlights

Throughout his career, Komekyu has worked with prominent companies in the semiconductor industry. He has been associated with Sumco Corporation and Mitsubishi Materials Corporation, where he has contributed to various projects and innovations. His experience in these organizations has helped him refine his skills and knowledge in the field.

Collaborations

Komekyu has collaborated with several talented individuals during his career. Notable coworkers include Hideki Fujiwara and Kazuhiro Ikezawa, who have also made significant contributions to the industry. Their collective efforts have further advanced the technology surrounding semiconductor materials.

Conclusion

Takashi Komekyu's work in developing a silicon electrode plate for plasma etching demonstrates his innovative spirit and commitment to enhancing semiconductor technology. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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