Tokyo, Japan

Takashi Kajitani

This inventor holds 1 USPTO granted patent. Top assignees: Tokyo Electron Limited, Tokyo Institute of Technology. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Kajitani. Retrieved from https://idiyas.com/inventor/takashi-kajitani-4s3m3f5j

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Takashi Kajitani: Innovator in Pattern Forming Methods

Introduction

Takashi Kajitani is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of pattern forming methods and plasma processing techniques. His work has significantly impacted the development of advanced materials and manufacturing processes.

Latest Patents

Kajitani holds a patent for a pattern forming method that involves creating a pattern film on a substrate. This method utilizes a triptycene derivative featuring a unique triptycene skeleton. The skeleton is structured with specific arrangements of positions that enhance the functionality of the pattern film. The triptycene derivative includes side chains that differ in etching selectivity ratios, which is crucial for the precision of the patterning process.

Career Highlights

Throughout his career, Takashi Kajitani has worked with notable organizations, including Tokyo Electron Limited and the Tokyo Institute of Technology. His experience in these institutions has allowed him to refine his skills and contribute to cutting-edge research and development in his field.

Collaborations

Kajitani has collaborated with various professionals, including his coworker Shin Oowada. These partnerships have fostered innovation and have led to advancements in the technologies they have worked on together.

Conclusion

Takashi Kajitani's contributions to the field of pattern forming methods exemplify the importance of innovation in technology. His patent and career achievements highlight his role as a key figure in advancing manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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