Hitachi, Japan

Takashi Furuya


Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 100(Granted Patents)


Location History:

  • Tsuchiura, JP (2001)
  • Hitachi, JP (2008 - 2013)

Company Filing History:


Years Active: 2001-2013

Loading Chart...
4 patents (USPTO):Explore Patents

Innovative Contributions of Takashi Furuya in Semiconductor Technology

Introduction

Takashi Furuya, a talented inventor based in Hitachi, Japan, has made significant strides in the field of semiconductor technology. With a total of four patents to his name, Furuya is recognized for his expertise and innovative approaches in developing manufacturing methods and devices that enhance semiconductor performance.

Latest Patents

Among his latest contributions, Furuya has developed a novel manufacturing method for a semiconductor photonic device substrate. This method involves successively and gradually crystal-growing multi-layer films with differing material compositions within a single chamber. By defining an inter-layer growth rate model, he established a relationship in growth rates between each layer, leading to optimally controlled growth times based on specific layer thicknesses. This method is executed with the aid of a computer system connected to MOCVD equipment, enabling precise crystal growth of semiconductor photonic devices.

Additionally, his innovative semiconductor light emitting device comprises a first conductivity type cladding layer, an active layer, and both first and second side multilayers that are transparent to the light generated at the active layer. These multilayers are specifically designed to have a larger bandgap than the active layer and maintain a lattice match, crucial for the efficient functioning of the device.

Career Highlights

Furuya's work with Hitachi Cable, Inc., a prominent player in the cable and semiconductor industries, has been a major factor in his success. His focus on enhancing semiconductor technologies reflects the company’s commitment to innovation and quality. His patents illustrate both his technical proficiency and his ability to address complex challenges in semiconductor manufacturing.

Collaborations

Throughout his career, Furuya has collaborated with notable colleagues, such as Taichiroo Konno and Masatomo Shibata, enhancing the collaborative spirit within the research and development environment at Hitachi Cable, Inc. These partnerships have allowed for the exchange of ideas and solutions, amplifying the impact of their contributions to the field.

Conclusion

In summary, Takashi Furuya stands out as an influential inventor in the semiconductor industry. His patented innovations not only contribute to advancements in technology but also highlight the importance of collaboration and research within leading companies like Hitachi Cable, Inc. As the demands for semiconductor devices continue to grow, Furuya’s work will undoubtedly play a crucial role in shaping the future of this technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…