Takanori Obaru

Title: Takanori Obaru: Innovator in Substrate Processing Technology

Introduction

Takanori Obaru is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His innovative work focuses on improving the efficiency and effectiveness of substrate cleaning methods and apparatus.

Latest Patents

Obaru's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing method involves a both-surface cleaning process, where a first cleaning body ejects fluid to one surface or comes into contact with it. This is followed by a synchronized horizontal movement of both the first cleaning body and a second cleaning body, which cleans the remaining surface of the substrate. Additionally, the method includes a side end cleaning process, where a third cleaning body is rotated and brought into contact with the side end of the substrate, ensuring thorough cleaning while performing the both-surface cleaning.

The substrate processing apparatus consists of a substrate holder, a first cleaning body, a first moving mechanism, a second cleaning body, a second moving mechanism, and a controller. The first cleaning body is responsible for cleaning one of the upper or lower surfaces of the substrate, while the second cleaning body cleans the other surface. The controller coordinates the movements of both cleaning bodies to achieve efficient cleaning.

Career Highlights

Takanori Obaru is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop and refine his innovative substrate processing technologies.

Collaborations

Obaru has collaborated with notable coworkers, including Nobuhiko Mouri and Yasushi Takiguchi. Their combined expertise has contributed to the advancement of substrate processing technologies.

Conclusion

Takanori Obaru's contributions to substrate processing technology have made a significant impact in the field. His innovative patents and work at Tokyo Electron Limited highlight his dedication to improving substrate cleaning methods.