Tokyo, Japan

Takakuni Maeda

This inventor holds 1 USPTO granted patent. Top assignee: Jeol Ltd.. Active years: 2022.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Takakuni Maeda: Innovator in Charged Particle Beam Technology

Introduction: Takakuni Maeda is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of charged particle beam systems. His innovative work has led to the development of advanced measurement techniques using scanning electron microscopes.

Latest Patents: Takakuni Maeda holds 1 patent for a "Charged particle beam system and method of measuring sample using scanning electron microscope." This patent describes a method where first shape data representing a three-dimensional shape of a sample unit is generated based on the results of three-dimensional shape measurement. Additionally, second shape data representing a three-dimensional shape of a structure within a sample chamber is created. The movement of the sample unit is then controlled to prevent collisions with the structure, enhancing measurement accuracy.

Career Highlights: Takakuni Maeda has made significant strides in his career, particularly through his work at Jeol Ltd. His expertise in charged particle beam technology has positioned him as a key figure in the field. His innovative approaches have contributed to advancements in electron microscopy.

Collaborations: Takakuni Maeda has worked alongside talented colleagues, including Yoshikazu Nemoto and Yuta Murakami. Their collaborative efforts have furthered research and development in their respective areas of expertise.

Conclusion: Takakuni Maeda's contributions to charged particle beam technology and his innovative patent demonstrate his commitment to advancing scientific measurement techniques. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
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