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For the Inventor, By the Inventor

Kanagawa, Japan

Takako Hirosaki

This inventor holds 15 USPTO granted patents and 1 EPO patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2001-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takako Hirosaki. Retrieved from https://idiyas.com/inventor/takako-hirosaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15

% Patents Active = 66.7


Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 65(Granted Patents)


Location History:

  • Hiratsuka, JP (2002 - 2006)
  • Kanagawa-ken, JP (2001 - 2012)
  • Kawasaki, JP (2011 - 2013)
  • Kanagawa, JP (2012 - 2013)

Company Filing History:

goldMedal15 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 2001-2013

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15 patents (USPTO):Explore Patents
1. 8455182 - Composition for antireflection film formation and method for resist pattern formation using the composition (2013-06-04),
2. 8389197 - Compound, positive resist composition and resist pattern forming method (2013-03-05),
3. 8216775 - Anti-reflection film forming material, and method for forming resist pattern using the same (2012-07-10),
4. 8206887 - Positive resist composition and resist pattern forming method (2012-06-26),
5. 8158328 - Composition for formation of anti-reflection film, and method for formation of resist pattern using the same (2012-04-17),
6. 8062825 - Positive resist composition and resist pattern forming method (2011-11-22),
7. 7981588 - Negative resist composition and method of forming resist pattern (2011-07-19),
8. 7871753 - Positive resist composition and method of forming resist pattern (2011-01-18),
9. 7033731 - Multilayered body for photolithographic patterning (2006-04-25),
10. 6864036 - Negative-working photoresist composition (2005-03-08),
11. 6544717 - Undercoating composition for photolithographic resist (2003-04-08),
12. 6455228 - Multilayered body for photolithographic patterning (2002-09-24),
13. 6406829 - Negative-working photoresist composition (2002-06-18),
14. 6297174 - Method for the formation of a planarizing coating film on substrate surface (2001-10-02),
15. 6284428 - Undercoating composition for photolithographic resist (2001-09-04),

Title: **Inventor Takako Hirosaki: Pioneering Innovations in Antireflection Film Technology**

Introduction

Takako Hirosaki is an accomplished inventor based in Kanagawa-ken, Japan. With an impressive portfolio of 15 patents, she has made significant contributions to the field of materials science and optics, particularly through her recent inventions related to antireflection films.

Latest Patents

Her latest patents focus on innovative compositions for antireflection film formation and methods for resist pattern formation. One notable invention is a composition for forming an antireflection film that is easily manageable and capable of producing films with superior optical characteristics, comparable to those formed using perfluorooctane sulfonate (PFOS). This composition incorporates a specific fluorine compound that enhances the optical properties of the antireflection film, ensuring high performance in optical applications.

Additionally, her work includes a positive resist composition and a method for forming resist patterns with reduced roughness. This positive resist composition features a compound represented by a detailed general formula, allowing for precision in crafting high-quality resist patterns vital for advanced manufacturing processes.

Career Highlights

Takako Hirosaki is associated with Tokyo Ohka Kogyo Co., Ltd., a leader in chemical products for the semiconductor industry. Her experience and expertise have driven her to the forefront of research and development in innovative materials, contributing to advancements in technology and manufacturing processes.

Collaborations

Throughout her career, Hirosaki has collaborated with talented colleagues, including Toshikazu Tachikawa and Fumitake Kaneko. These collaborations have fostered a productive environment for innovation, leading to groundbreaking inventions that impact various technological fields.

Conclusion

In conclusion, Takako Hirosaki's inventive spirit and dedication to research exemplify the importance of innovation in advancing technology. Her patents not only highlight her expertise but also contribute to enhancing the performance of materials used in numerous applications. As a prominent figure in her field, Hirosaki continues to inspire future generations of inventors and researchers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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