Beaverton, OR, United States of America

Takahito Mukawa

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2012-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahito Mukawa. Retrieved from https://idiyas.com/inventor/takahito-mukawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 1.3

ph-index = 1


Location History:

  • Yamanashi, JP (2012)
  • Beaverton, OR (US) (2019)

Company Filing History:


Years Active: 2012-2019

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2 patents (USPTO):Explore Patents

Title: Takahito Mukawa: Innovator in Etching Technology

Introduction

Takahito Mukawa is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the field of etching technology, holding a total of 2 patents. His work focuses on methods and apparatuses that enhance the precision and efficiency of etching organic materials.

Latest Patents

One of his latest patents is titled "Process for performing self-limited etching of organic materials." This invention describes a method and apparatus for selectively etching an organic material on a substrate. The process involves forming a first plasma-excited process gas containing hydrogen and optionally a noble gas element. The substrate is then exposed to this gas, followed by the formation of a second plasma-excited process gas containing a noble gas element. The method cyclically repeats the forming and exposing of the first and second plasma-excited process gases at least two cycles to achieve selective etching.

Another significant patent is the "Etching method and etching apparatus." This invention provides a method and apparatus suitable for etching an antireflection coating layer using a resist film as a mask. The etching method includes forming the antireflection coating layer on an etching target layer and applying a patterned resist film on the coating layer. A desired pattern is created by introducing an etching gas into a processing chamber and etching the antireflection coating layer while using the resist film as a mask.

Career Highlights

Takahito Mukawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop innovative solutions that address the challenges faced in etching processes.

Collaborations

Takahito collaborates with various professionals in his field, including his coworker Hiroto Ohtake. Their combined expertise contributes to the advancement of etching technologies.

Conclusion

Takahito Mukawa is a prominent inventor whose work in etching technology has led to significant advancements in the field. His patents reflect his commitment to innovation and precision in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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