Miyagi, Japan

Takahisa Iwasaki


Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Miyagi, JP (2015 - 2020)
  • Hillsboro, OR (US) (2022)

Company Filing History:


Years Active: 2015-2022

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Takahisa Iwasaki

Introduction

Takahisa Iwasaki is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing and etching methods. With a total of 3 patents to his name, Iwasaki's work has advanced the technology used in various industrial applications.

Latest Patents

Iwasaki's latest patents include a method of etching film and a plasma processing apparatus. The etching method involves a substrate with an underlying region, a film, and a mask. The process includes performing main etching on the film through plasma etching, which exposes part of the underlying region. Additionally, a protective layer is formed on the side wall surface of the mask after the main etching. This layer is made from a different material than the film. The method also includes over-etching the film after forming the protective layer.

The plasma processing method involves forming a carbon-containing film on the surfaces of components in a chamber using plasma from a carbon-containing gas. A silicon-containing film is then formed on the carbon film, with its thickness determined by the carbon film's thickness. After processing a target object in the chamber, the silicon film is removed using plasma from a fluorine-containing gas, followed by the removal of the carbon film with plasma from an oxygen-containing gas.

Career Highlights

Takahisa Iwasaki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work at the company has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of plasma processing technologies.

Collaborations

Iwasaki has collaborated with notable coworkers, including Kosuke Ogasawara and Kentaro Ishii. Their teamwork has contributed to the successful development of advanced technologies in their field.

Conclusion

Takahisa Iwasaki's contributions to plasma processing and etching methods have made a significant impact on the industry. His innovative patents and collaborative efforts continue to drive advancements in technology.

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