Hachioji, Japan

Takahiro Kohashi


Average Co-Inventor Count = 4.8

ph-index = 7

Forward Citations = 85(Granted Patents)


Location History:

  • Hachioji, JA (1978)
  • Tsukui, JP (1984 - 1985)
  • Kanagawa, JP (1985)
  • Hachioji, JP (1980 - 1986)

Company Filing History:


Years Active: 1978-1986

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10 patents (USPTO):Explore Patents

Title: **Takahiro Kohashi: A Pioneer in Semiconductor Manufacturing Technology**

Introduction

Takahiro Kohashi is an innovative inventor based in Hachioji, Japan, with a remarkable portfolio of 10 patents. His groundbreaking contributions to semiconductor manufacturing have significantly advanced the field, making him a noteworthy figure in the industry.

Latest Patents

Kohashi's latest inventions include a "Method of forming a microscopic pattern with far UV pattern exposure." This innovative technique involves irradiating a film of photoresist containing phenolic hydroxyl groups with far-ultraviolet radiation, followed by development using an alkaline aqueous solution. The resist pattern obtained allows for dry etching to create a highly precise microscopic pattern, thanks to the photoresist's immunity against the etching process. Furthermore, by incorporating an azide with a specific structure, the sensitivity of the photoresist to far-ultraviolet radiation is significantly enhanced.

Another significant patent is the "Method of manufacturing semiconductor device utilizing multilayer mask." This method is instrumental in producing field effect transistors by forming a distinctive pattern with a wider upper layer and a narrower lower layer at the gate electrode position. By utilizing this pattern as a mask, impurity regions are formed on both sides of the gate region through ion implantation. The final stages involve burying the lower layer in etching-selective organic high polymer material, leading to the formation of a gate electrode after the removal of the lower layer.

Career Highlights

Kohashi's work at Hitachi, Ltd. has positioned him at the forefront of semiconductor technology. His inventiveness and technical expertise have not only advanced Hitachi's research and development efforts, but have also contributed to the global innovation landscape in semiconductor manufacturing.

Collaborations

Throughout his career, Takahiro Kohashi has collaborated with esteemed colleagues, including Saburo Nonogaki and Motoo Akagi. This teamwork has fostered an environment of creativity and innovation, enabling the development of advanced technologies that impact the semiconductor industry.

Conclusion

Takahiro Kohashi stands out as a key innovator in semiconductor manufacturing, with a strong track record of patents and collaborative efforts. His recent inventions demonstrate a commitment to advancing technology and maintaining precision in the ever-evolving field of electronics. As the industry continues to grow, Kohashi's contributions will likely play a crucial role in shaping the future of semiconductor devices.

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