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For the Inventor, By the Inventor

Kuki, Japan

Takahiro Akamatsu

This inventor holds 8 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 1989-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahiro Akamatsu. Retrieved from https://idiyas.com/inventor/takahiro-akamatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 50.0

Average Co-Inventor Count = 1.4

ph-index = 6

Forward Citations = 209(Granted Patents)


Location History:

  • Machida, JP (1989 - 1992)
  • Tokyo, JP (1993)
  • Saitama, JP (2006)
  • Kuki, JP (2007 - 2009)

Company Filing History:

goldMedal8 out of 93,085 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1989-2009

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8 patents (USPTO):Explore Patents
1. 7522264 - Projection exposure apparatus, device manufacturing method, and sensor unit (2009-04-21),
2. 7256868 - Projection exposure apparatus, device manufacturing method, and sensor unit (2007-08-14),
3. 7154524 - Exposure apparatus including a controller configured to read electrical signals from an array of photoelectric converters (2006-12-26),
4. 7027079 - Exposure apparatus including a read circuit for reading electrical signals from a plurality of photoelectric converters (2006-04-11),
5. 5258823 - Alignment system (1993-11-02),
6. 5162642 - Device for detecting the position of a surface (1992-11-10),
7. 4887904 - Device for positioning a semi-conductor wafer (1989-12-19),
8. 4853880 - Device for positioning a semi-conductor wafer (1989-08-01),

Title: Takahiro Akamatsu: Innovator in Projection Exposure Technology

Introduction

Takahiro Akamatsu is a prominent inventor based in Kuki, Japan. He has made significant contributions to the field of projection exposure technology, holding a total of 8 patents. His work primarily focuses on enhancing the efficiency and effectiveness of device manufacturing methods.

Latest Patents

Akamatsu's latest patents include innovative designs for projection exposure apparatuses. One of his notable inventions is a projection exposure apparatus that features a projection optical system, which exposes a substrate through the optical system and a liquid. This apparatus is designed to fill the gap between the projection optical system and the substrate with the liquid, enhancing the exposure process. Additionally, he has developed a sensor unit that detects light incident through the projection optical system and includes a vessel housing the light-receiving element. This design incorporates a sealing window that transmits light while sealing the vessel, and a driving mechanism that aligns the substrate. The space between the sealing window and the light-receiving element is filled with a liquid that serves both as a coolant and has a refractive index greater than one.

Career Highlights

Akamatsu is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to push the boundaries of technology in the field of projection exposure, contributing to advancements that are crucial for modern device manufacturing.

Collaborations

Throughout his career, Akamatsu has collaborated with notable colleagues, including Hiroshi Nakazato and Takashi Matsumura. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in their field.

Conclusion

Takahiro Akamatsu is a key figure in the realm of projection exposure technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to shape the future of device manufacturing, making him a significant inventor in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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