The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7522264 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 21, 2009

Filed:

Jun. 18, 2007
Applicant:

Takahiro Akamatsu, Kuki, JP;

Inventor:

Takahiro Akamatsu, Kuki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract

A projection exposure apparatus, which has a projection optical system and exposes a substrate through the projection optical system and a liquid, while a gap between the projection optical system and the substrate is filled with the liquid. The apparatus includes a light-receiving element configured to detect light incident thereon through the projection optical system and the liquid, a vessel in which the light-receiving element is arranged, and a fluoroplastic filling a space within the vessel to cover the light-receiving element.


Find Patent Forward Citations

Akamatsu, Takahiro. (2009). Projection exposure apparatus, device manufacturing method, and sensor unit (U.S. Patent No. 7522264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7522264

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…