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Takafumi Sakurada

USPTO Granted Patents = 9

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 17(Granted Patents)

Location History:

Ibaraki, JP (2011)
Hitachi, JP (2012 - 2018)

Company Filing History:

Hitachi Chemical Company, Ltd.

Years Active: 2011-2018

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9944827 - CMP polishing solution and polishing method (2018-04-17),

2. 8901002 - Polishing slurry for metal films and polishing method (2014-12-02),

3. 8821750 - Metal polishing slurry and polishing method (2014-09-02),

4. 8791019 - Metal polishing slurry and method of polishing a film to be polished (2014-07-29),

5. 8609541 - Polishing slurry for metal films and polishing method (2013-12-17),

6. 8481428 - Polishing slurry and polishing method (2013-07-09),

7. 8328893 - Method of producing oxide particles, slurry, polishing slurry, and method of polishing substrate (2012-12-11),

8. 8084363 - Polishing slurry and polishing method (2011-12-27),

9. 8084362 - Polishing slurry and polishing method (2011-12-27),

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