Hiratsuka, Japan

Takafumi Kimura


Average Co-Inventor Count = 2.5

ph-index = 4

Forward Citations = 115(Granted Patents)


Location History:

  • Hiratsuka, JP (1990 - 1993)
  • Kawasaki, JP (2000)

Company Filing History:


Years Active: 1990-2000

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5 patents (USPTO):Explore Patents

Title: Takafumi Kimura: Innovator in Chemical Vapor Deposition

Introduction

Takafumi Kimura is a prominent inventor based in Hiratsuka, Japan. He has made significant contributions to the field of chemical vapor deposition, holding a total of 5 patents. His work focuses on innovative methods for growing dielectric films, which are essential in various electronic applications.

Latest Patents

Among his latest patents, one notable invention is a method for growing a dielectric film containing strontium (Sr) on a substrate. This process involves dissolving a Sr compound into an organic solvent or mixing it with an amine compound to create a source material. The source material is then vaporized to produce a gaseous form, which is decomposed near the substrate surface to deposit the dielectric film. Another significant patent details an apparatus for chemical vapor deposition, which includes multiple gas-generating chambers and a film-growing chamber designed for efficient gas phase reactions.

Career Highlights

Takafumi Kimura is currently employed at Fujitsu Corporation, where he continues to advance the field of chemical vapor deposition. His innovative approaches have positioned him as a key figure in the development of new technologies that enhance electronic components.

Collaborations

Throughout his career, Kimura has collaborated with notable colleagues, including Hideki Yamawaki and Masaru Ihara. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Takafumi Kimura's contributions to the field of chemical vapor deposition are noteworthy, with several patents that reflect his innovative spirit. His work at Fujitsu Corporation and collaborations with esteemed colleagues further highlight his impact on technology and innovation.

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