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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 4931425 B1

PDFFull Text
Date of Patent:
Jun. 05, 1990

Filed:

Sep. 27, 1988

Process for chemical vapor deposition of superconductive oxide

Applicant:
Inventors:

Takafumi Kimura, Hiratsuka, JP;

Hideki Yamawaki, Isehara, JP;

Kazuto Ikeda, Atsugi, JP;

Masaru Ihara, Chigasaki, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:

Staas & Halsey

Primary Examiner:

Norman Morgenstern

Assistant Examiner:

Roy V King

Int. Cl.
CPC ...
C23C / ; B05D / ;
U.S. Cl.
CPC ...
505-1 ; 427 62 ; 4272553 ; 4272552 ; 4272551 ; 427255 ; 4272481 ; 427314 ; 505730 ;
Abstract

A thin film of a high temperature superconductive oxide of rare earth metal-alkali earth metal-copper-oxygen system or group VA metal-alkali earth metal-copper-oxygen system, which has an excellent crystallinity, particularly a single crystalline structure, is formed on a substrate by a CVD method, in which halides of the metals and an oxygen source gas are separately flowed over a substrate and caused to react with each other over the substrate, to deposit a desired superconducting oxide film.

Find Patent Forward Citations

Kimura, Takafumi. (1990). Process for chemical vapor deposition of superconductive oxide (U.S. Patent No. 4931425). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4931425

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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