This inventor holds 3 USPTO granted patents. Top assignee: Nihon Shinku Gijutsu Kabushiki Kaisha. Active years: 1998-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998-2002
Title: Taijiro Uchida: Innovator in Plasma Processing Technology
Introduction
Taijiro Uchida is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His innovative work focuses on developing devices that enhance the efficiency and effectiveness of plasma processing applications.
Latest Patents
Uchida's latest patents include a discharge plasma processing device and an apparatus for generating and utilizing magnetically neutral line discharge type plasma. The discharge plasma processing device features a chamber equipped with an evacuation system, a magnetic field generation system, and an electric field application system. This device is designed to form a magnetic neutral line in the vacuum chamber, allowing for the production of plasma along this line. This technology is particularly useful for various plasma processing methods, including sputtering, etching, and plasma-enhanced chemical vapor deposition (CVD), enabling precise control over the plasma parameters.
The apparatus for generating magnetically neutral line discharge type plasma comprises a magnetic field generating coil that forms magnetically neutral lines within the vacuum chamber. This design minimizes plasma loss and potential damage to the chamber's lateral walls. The neutral line discharge type plasma is capable of generating a well-thermalized Maxwellian distribution plasma, which is advantageous for ion extraction applications.
Career Highlights
Taijiro Uchida is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to innovate in the field of plasma technology. His work has garnered attention for its practical applications in various industries, enhancing the capabilities of plasma processing.
Collaborations
Uchida has collaborated with notable colleagues, including Wei Chen and Takeshi Sunada, contributing to advancements in plasma technology through teamwork and shared expertise.
Conclusion
Taijiro Uchida's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patents reflect a commitment to enhancing the efficiency of plasma applications, making significant strides in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile