The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2002
Filed:
Jul. 25, 1994
Applicant:
Inventor:
Taijiro Uchida, Chigasaki, JP;
Assignee:
Nihon Shinku Gijutsu Kabushiki Kaisha, Chicasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ; C23C 1/434 ; H01L 1/00 ;
U.S. Cl.
CPC ...
C23C 1/600 ; C23C 1/434 ; H01L 1/00 ;
Abstract
A discharge plasma processing device comprising a chamber with an evacuation system, a magnetic field generation system and an electric field application system with which the feature of operation is first to form a magnetic neutral line in the vacuum chamber and second to produce a plasma along the magnetic neutral line by controlling the shape of the line, its position related to an object to be processed and the plasma parameters is presented as useful device for many kinds of plasma processing like as sputtering, etching and plasma enhanced CVD as freely programmed, for instance extremely in uniform on the surface of the object.