Introduction: Tai-Chou Lee is an esteemed inventor based in Chiayi County, Taiwan. With a remarkable portfolio of five patents, he is dedicated to advancing the field of thin film technology. His innovative methodologies and inventions have garnered attention in the scientific community, showcasing his commitment to excellence in research and development.

Latest Patents: Among Tai-Chou Lee's latest contributions are two significant patents that enhance the processes involved in thin film production. The first patent, titled "Method and apparatus of growing a thin film," outlines a comprehensive approach comprising several steps: providing and cleaning substrates, placing them into a reaction liquid, and employing ultrasonic waves to vibrate the liquid, ensuring an even growth of the thin film on the substrates. The second patent, "Method and apparatus for growing a composite metal sulfide photocatalyst thin film," describes a technique that utilizes both photochemical and chemical bath deposition to create composite metal sulfide thin films, such as (AgInS)/(ZnS). This innovative approach allows for the efficient production of high-quality photocatalysts.

Career Highlights: Tai-Chou Lee serves at the Industrial Technology Research Institute, a well-respected organization known for its advancements in technological research and development. His work there has significantly influenced the domain of material science, particularly in the synthesis and application of thin films.

Collaborations: During his career, Tai-Chou Lee has collaborated with several notable professionals in the field, including Jau-Chyn Huang and Ching-Chen Wu. These partnerships have fostered an environment of innovation and shared expertise, contributing to groundbreaking advancements in thin film technologies.

Conclusion: With his extensive research and innovative patents, Tai-Chou Lee has firmly established himself as a significant figure in the field of thin film technology. His commitment to pushing the boundaries of scientific discovery continues to inspire future generations of inventors and researchers.

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