Hsinchu, Taiwan

Tahorng Yang


Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003-2006

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Tahorng Yang

Introduction

Tahorng Yang, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of four patents to his name, Yang's innovations have paved the way for advancements in memory fabrication techniques.

Latest Patents

His latest patents showcase his expertise in memory device fabrication. One notable patent is a "Method for fabricating read only memory including a first and second exposures to a photoresist layer." This patent describes a fabrication method aimed at creating more efficient memory cells by incorporating precise layers and tailored ion implantation techniques to optimize the performance of memory devices.

Another innovative patent by Tahorng Yang is the "Hole forming by cross-shape image exposure." This technique involves designing a photomask with altered rectangular patterns that create cross-shaped patterns for improved optical image contrast. This results in the formation of circular or elliptical contact holes on a photoresist layer, enhancing the quality and efficiency of hole formation processes in semiconductor manufacturing.

Career Highlights

Throughout his career, Tahorng Yang has showcased a commitment to innovation, exemplified by his role at Macronix International Co., Ltd. His work has not only contributed to the company's success but has also influenced the broader semiconductor industry.

Collaborations

Yang has collaborated with remarkable professionals such as Ching-Yu Chang and Henry Chung, further enhancing the collaborative spirit in the field of semiconductor research. Together, they have combined their expertise to push the boundaries of technology and develop cutting-edge solutions.

Conclusion

In conclusion, Tahorng Yang's contributions to the field of semiconductor technology exemplify the spirit of innovation. His patents reflect a deep understanding of fabrication methods, paving the way for future advancements in memory technology. As he continues to collaborate with other experts in the field, the potential for further breakthroughs remains promising.

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