Tah-Te Shih

Title: Innovations of Inventor Tah-Te Shih

Introduction

Tah-Te Shih is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advanced fabrication methods and structures that enhance the performance of semiconductor devices.

Latest Patents

Among his latest patents is a "Capacitor structure and fabrication method thereof." This invention involves a DRAM capacitor structure that is strategically placed on the interior surface of a vertical hollow cylinder of a support structure, which is positioned over a semiconductor substrate. The support structure also features a horizontal supporting layer that is integrally connected with the vertical hollow cylinder. Additionally, he has developed a "Method for fabricating fine patterns of semiconductor device utilizing self-aligned double patterning." This method outlines a comprehensive process for creating semiconductor devices, including the formation of mask patterns and etching techniques to achieve precise structures.

Career Highlights

Tah-Te Shih has worked with prominent companies in the semiconductor industry, including Inotera Memories, Inc. and Vanguard International Semiconductor Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Tah-Te Shih has collaborated with esteemed colleagues, including Chung-Yuan Lee and Tsung-Cheng Yang. These partnerships have fostered an environment of innovation and have led to the development of advanced technologies in the semiconductor field.

Conclusion

Tah-Te Shih's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.